DocumentCode :
3422675
Title :
Micro mechanical single crystal silicon fracture studies torsion and bending
Author :
Saif, M.T.A. ; MacDonald, N.C.
Author_Institution :
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
fYear :
1996
fDate :
11-15 Feb 1996
Firstpage :
105
Lastpage :
109
Abstract :
We introduce a micro electro mechanical system to characterize materials as their size is reduced to submicron scale. We employ the system to study the strength of a single crystal silicon pillar subjected to twisting and bending. The minimum width of the pillar is 0.5 μm. Its length is less than 10 μm. It twists by more than 20° before failure. The maximum normal and shear stress at failure are estimated to be 20 GPa and 8.5 GPa respectively
Keywords :
bending; calibration; elemental semiconductors; fracture; fracture mechanics; fracture toughness testing; mechanical variables measurement; micromechanical devices; silicon; torsion; 10 mum; 20 GPa; 5 mum; 8.5 GPa; Si; Si pillar; bending; failure; micromechanical fracture; normal stress; shear stress; single crystal silicon fracture; submicron scale; torsion; twisting; Composite materials; Crystalline materials; Fatigue; Materials testing; Mechanical factors; Mechanical systems; Nanofabrication; Silicon; Stress; System testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1996, MEMS '96, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE, The Ninth Annual International Workshop on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-2985-6
Type :
conf
DOI :
10.1109/MEMSYS.1996.493837
Filename :
493837
Link To Document :
بازگشت