• DocumentCode
    342437
  • Title

    Characterization of 1/f noise vs. number of gate stripes in MOS transistors

  • Author

    Chen, Hsin-Shu ; Ito, Akira

  • Author_Institution
    Harris Semicond., Melbourne, FL, USA
  • Volume
    2
  • fYear
    1999
  • fDate
    36342
  • Firstpage
    310
  • Abstract
    This paper examines low-frequency 1/f noise (or Bicker noise) in metal oxide semiconductor field-effect transistors (MOSFETs) versus number of gate stripes and bias conditions. Simulations using SPICE/Spectre with Cadence models have displayed the dependence of 1/f noise on the number of gate stripes and the bias conditions. Experimental results from a test chip designed and fabricated in a 0.5 μm CMOS process show that 1/f noise is independent of the number of gate stripes in both saturation and linear regions for both P-channel and N-channel devices. The measured results have also shown that 1/f noise is independent of the bias conditions in the saturation region but dependent on the bias conditions in the linear region
  • Keywords
    1/f noise; MOSFET; SPICE; semiconductor device models; semiconductor device noise; 0.5 micron; 1/f noise; Bicker noise; MOS transistors; N-channel devices; P-channel devices; SPICE; Spectre; bias conditions; gate stripes; linear regions; saturation regions; CMOS process; FETs; Low-frequency noise; MOSFETs; Noise measurement; SPICE; Semiconductor device measurement; Semiconductor device modeling; Semiconductor device noise; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 1999. ISCAS '99. Proceedings of the 1999 IEEE International Symposium on
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    0-7803-5471-0
  • Type

    conf

  • DOI
    10.1109/ISCAS.1999.780720
  • Filename
    780720