DocumentCode :
3425486
Title :
Fully integrated nanoresonator system with attogram/Hz mass resolution
Author :
Worsen, E. ; Abadal, G. ; Nilsson, S.G. ; Verd, J. ; Sandberg, R. ; Svendsen, J.T. ; Teva, J. ; Peréz-Murano, F. ; Esteve, J. ; Figueras, E. ; Campabadal, F. ; Montelius, L. ; Barniol, N. ; Boisen, A.
Author_Institution :
Dept. of Micro & Nanotechnol., Tech. Univ. of Denmark, Denmark
fYear :
2005
fDate :
30 Jan.-3 Feb. 2005
Firstpage :
867
Lastpage :
870
Abstract :
Nanoresonator systems have been fully integrated on pre-processed complementary metal oxide semiconductor (CMOS) chips. The systems have been used for high sensitivity mass sensing in air and vacuum. The resonator system, which consists of a cantilever and structures for electrostatic actuation and capacitive read-out, has been defined by low energy electron beam lithography (EBL) combined with direct write laser lithography (DWL) on top of a radiation sensitive CMOS layer. The fabrication of the nanoresonator system has been conducted as a post-process step. CMOS integration radically decreases the parasitic capacitance, enabling detection and amplification of the resonance signal directly on the chip. Fabricated resonator systems have been designed to have resonance frequencies in the range of 1-1.6 MHz. A mass resolution of 3 ag/Hz has been determined in air by placing a single glycerine drop at the apex of a cantilever and subsequently measuring a frequency shift of 14.8 kHz. The frequency shift corresponds to an added mass of 50 fg, which is close to the estimated weight of 41 fg for the glycerine drop.
Keywords :
CMOS integrated circuits; electron beam lithography; micromechanical resonators; nanotechnology; 1 to 1.6 mHz; 14.8 kHz; capacitive read-out; complementary metal oxide semiconductor chips; direct write laser lithography; electrostatic actuation; higb sensitivity mass sensing; low energy electron beam lithography; mass resolution; nanoresonator system; radiation sensitive CMOS; Electron beams; Electrostatic actuators; Energy resolution; Frequency estimation; Lithography; Optical device fabrication; Parasitic capacitance; Resonance; Semiconductor lasers; Vacuum systems;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-8732-5
Type :
conf
DOI :
10.1109/MEMSYS.2005.1454067
Filename :
1454067
Link To Document :
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