Title :
Improving the efficiency and effectiveness of integrated circuit manufacturing technology development
Author_Institution :
Technol. Simulation & Adv. Methodology, VLSI Technol. Inc., San Jose, CA, USA
Abstract :
This paper presents a new technology development paradigm for the semiconductor industry. This new approach offers a great potential for a significant reduction in the development cycle-time and cost over the conventional development paradigm. The potential risks of the new approach and the strategies to manage these risks are described
Keywords :
electronics industry; integrated circuit manufacture; risk management; technology CAD (electronics); development cost reduction; development cycle-time reduction; effectiveness; efficiency improvement; integrated circuit manufacturing technology development; risk management; semiconductor industry; Application specific integrated circuits; Costs; Design automation; Fabrication; Impurities; Integrated circuit manufacture; Integrated circuit technology; Risk management; Semiconductor device manufacture; Semiconductor device modeling;
Conference_Titel :
Management of Engineering and Technology, 1999. Technology and Innovation Management. PICMET '99. Portland International Conference on
Conference_Location :
Portland, OR
Print_ISBN :
1-890843-02-4
DOI :
10.1109/PICMET.1999.787853
