DocumentCode :
3444558
Title :
kHz femtosecond laser plasma x-ray and ion source
Author :
Korn, G. ; Thoss, A. ; Faubel, M. ; Stiel, H. ; Voigt, U. ; Richardson, M. ; Elsaesser, T.
Author_Institution :
Max-Born-Institut, Berlin, Germany
fYear :
2001
fDate :
11-11 May 2001
Firstpage :
113
Lastpage :
114
Abstract :
Summary form only given. Femtosecond laser plasmas have attracted much interest in recent years as intense short pulses x-ray sources in the keV range for a variety of applications, such as lattice dynamics of semiconductor materials. There would be many advantages to having high repetition rate (kHz) versions of this source, but for this the laser must be able to provide sufficient intensity, and it must be integrated with a debris-free, continuous target. We describe the first demonstration of a kHz femtosecond laser plasma source produced from a liquid metal jet target. With a 30 /spl mu/m diameter liquid Ga jet, this source produces photon numbers of up to 5 /spl times/ 10/sup 8/ photons/sec in 4/spl pi/ sterad using a kHz Ti:sapphire laser producing 50 fs-pulses with an energy of 1.8 mJ at a repetition rate of 1 kHz.
Keywords :
X-ray production; gallium; high-speed optical techniques; jets; liquid metal ion sources; plasma production by laser; 1.8 mJ; 30 micron; 50 fs; Al/sub 2/O/sub 3/:Ti; Ga; Ti:sapphire laser; debris-free continuous target; high repetition rate; ion source; kHz femtosecond laser plasma x-ray source; liquid Ga jet; liquid metal jet target; photon numbers; Ion sources; Lattices; Optical pulses; Plasma applications; Plasma materials processing; Plasma sources; Plasma x-ray sources; Semiconductor lasers; Semiconductor materials; X-ray lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-662-1
Type :
conf
DOI :
10.1109/CLEO.2001.947559
Filename :
947559
Link To Document :
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