• DocumentCode
    3448254
  • Title

    Effect of lattice strains in the measurement of the (220) lattice spacing of silicon

  • Author

    Mana, Giovanni ; Palmisano, Carlo ; Zosi, Gianfranco

  • Author_Institution
    Ist. di Metrologia G. Colonnetti, Torino
  • fYear
    2004
  • fDate
    38139
  • Firstpage
    443
  • Lastpage
    444
  • Abstract
    The measurement of the Si lattice parameter a0 with an uncertainty lower than 10-8, requires to study the role of lattice strains of various kind. The Takagi´s approach has been used to study the modulation parameters of outgoing X-ray beams
  • Keywords
    X-ray spectroscopy; crystal structure; lattice constants; silicon; (220) lattice spacing measurement; Takagi´s approach; X-ray beams; lattice parameter; lattice strains effect; silicon; Atomic measurements; Capacitive sensors; Density measurement; Equations; Finite element methods; Lattices; Optical modulation; Silicon; Spectroscopy; Strain measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Precision Electromagnetic Measurements Digest, 2004 Conference on
  • Conference_Location
    London
  • Print_ISBN
    0-7803-8494-6
  • Electronic_ISBN
    0-7803-8494-6
  • Type

    conf

  • DOI
    10.1109/CPEM.2004.305301
  • Filename
    4097312
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3448254