• DocumentCode
    3449335
  • Title

    Rapid deposition of poly-Si thin film on glass substrates for solar application

  • Author

    Ding, Peijun ; Song, Guanghua ; Poppe, Steve ; Fu, Jianming ; Xu, Zheng ; Chung, Ben ; Yan, Lou

  • Author_Institution
    Sierra Solar Power, Inc., Fremont, CA, USA
  • fYear
    2009
  • fDate
    7-12 June 2009
  • Abstract
    In this paper, a rapid deposition method is developed for thin film poly-Si growth on various cheap borosilicate glasses. The depositing film is smooth and its thickness can be well controlled at 50 ¿m. The film thickness is mainly determined by the pulling-speed of glass substrates. The grain size of the film varies from 30-100 ¿m. Sinton PCD measurement indicates the effective lifetime ¿ above 1.1 ¿s after SiNx coating on the front surface and forming gas annealing. The actual lifetime can be even higher because of lack of passivation on the rear surface.
  • Keywords
    borosilicate glasses; carrier lifetime; elemental semiconductors; grain size; passivation; semiconductor thin films; silicon; solar cells; substrates; Si; Sinton PCD measurement; borosilicate glasses; carrier lifetime; glass substrates; grain size; passivation; polysilicon thin film; rapid deposition; size 30 mum to 100 mum; solar application; Glass; Sputtering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
  • Conference_Location
    Philadelphia, PA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-2949-3
  • Electronic_ISBN
    0160-8371
  • Type

    conf

  • DOI
    10.1109/PVSC.2009.5411727
  • Filename
    5411727
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3449335