• DocumentCode
    3452202
  • Title

    Potential issues on optical proximity correction (OPQ) using double dipole lithography

  • Author

    Chiou, Tsann-Bim ; Hsu, Stephen ; Eurlings, Mark ; Hendrickx, Eric ; Chen, Alek

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    38
  • Lastpage
    39
  • Keywords
    Asia; Cities and towns; Lighting; Lithography; Logic design; Logic devices; Optical filters; Optical imaging; Paper technology; Telephony;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245710
  • Filename
    1459460
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3452202