DocumentCode :
3452387
Title :
Impact of the tunnel etching process on electrical performances of SON devices.
Author :
Borel, S. ; Arvei, C. ; Bilde, J. ; Caubet, V. ; Chanemougame, D. ; Monfray, S. ; Ranica, R. ; Skotnick, T.
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
50
Lastpage :
51
Keywords :
CMOS process; Dry etching; Electronic mail; Germanium silicon alloys; Manufacturing; Plasma measurements; Process control; Semiconductor films; Silicon germanium; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245716
Filename :
1459466
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3452387
