Title :
Experimental and theoretical studies on Mo/Si multilayers for extreme ultraviolet lithography using picosecond ultrasonics
Author :
Nen-Wen Pu ; Bokor, J.
Author_Institution :
Dept. of Appl. Phys., Chung Cheng Inst. of Technol., Taoyuan, Taiwan
Abstract :
Summary form only given. Mo/Si multilayer mirror coatings are a key enabling technology for extreme ultraviolet (EUV) lithography, a promising next-generation tool for the mass production of integrated circuits with design rules below 0.1 /spl mu/m. We have performed experimental and theoretical studies on the vibrational behavior of Mo/Si multilayers for EUV lithography using picosecond ultrasonics. Foundations have been laid for applying this technique in nondestructive characterization of multilayer coatings.
Keywords :
X-ray lithography; high-speed optical techniques; mirrors; molybdenum; optical multilayers; optical pumping; photoacoustic effect; reflectivity; silicon; ultrasonic materials testing; ultraviolet lithography; vibrational modes; 0.1 micron; EUV lithography; Mo-Si; Mo/Si multilayer mirror coatings; Mo/Si multilayers; acoustic waves; design rules; extreme ultraviolet lithography; impulsively excited; integrated circuits; mass production; next-generation tool; nondestructive characterization; picosecond ultrasonics; pump-probe transient reflectivity technique; ultrashort pulses; vibrational behavior; Coatings; Equations; Frequency; Integrated circuit technology; Laser excitation; Lithography; Nonhomogeneous media; Optical pulses; Optical surface waves; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-662-1
DOI :
10.1109/CLEO.2001.948018
