DocumentCode :
3454372
Title :
Effect of high-frequency variation on ArF photoresist deformation during superimposed dual frequency (DFS) capacitively coupled plasma etching
Author :
Kim, H. ; Cho, S.H. ; Lee, N.-E.
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
192
Lastpage :
193
Keywords :
Etching; Frequency; Hafnium; Plasma applications; Plasma devices; Plasma materials processing; Plasma waves; Resists; Rough surfaces; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245789
Filename :
1459539
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3454372
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