Oxygen gas assisted electron beam lithography in organosilane self-assembled monolayers

Author

Yamaguchi, M. ; Saito, N. ; Takai, O.

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

198

Lastpage

199

Keywords

Atomic force microscopy; Computer science; Design engineering; Electron beams; Focusing; Ion beams; Lithography; Oxygen; Resists; Self-assembly;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245792

Filename

1459542

Link To Document