DocumentCode :
3455614
Title :
Studies of the dependence on oxidation thermal processes of effects on the electrical properties of silicon detectors by fast neutron radiation
Author :
Li, Zheng ; Kraner, H.W.
Author_Institution :
Brookhaven Nat. Lab., Upton, NY, USA
fYear :
1991
fDate :
2-9 Nov. 1991
Firstpage :
239
Abstract :
High-resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975 degrees C to 1200 degrees C) have been exposed to fast neutron irradiation up to a fluence of a few times 10/sup 14/ n/cm/sup 2/. New measurement techniques such as capacitance-voltage (C-V) of MOS capacitors and current-voltage (I-V) of back-to-back diodes (p/sup +/-n/sup -/-p/sup +/ if n/sup -/ is not inverted to p) or resistors (p/sup +/-p-p/sup +/ if inverted) have been introduced in monitoring the possible type-inversion (n to p) under high neutron fluence. No type-inversion in the material underneath SiO/sub 2/ and the p/sup +/ contact has been observed so far for detectors made on the five oxides up to a neutron fluence of a few times 10/sup 13/ n/cm/sup 2/. However, it has been found that detectors made on higher-temperature oxides (T>or=1100 degrees C) exhibit less leakage current increase at high neutron fluence ( phi >or=10/sup 13/ n/cm/sup 2/).<>
Keywords :
neutron effects; oxidation; semiconductor counters; semiconductor diodes; 975 to 1200 degC; MOS capacitors; Si-SiO/sub 2/; back-to-back diodes; capacitance-voltage; current-voltage; fast neutron irradiation; leakage current; light resistivity Si detector; oxidation thermal processes; resistors; type-inversion; Capacitance-voltage characteristics; Detectors; Diodes; MOS capacitors; Measurement techniques; Monitoring; Neutrons; Oxidation; Resistors; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nuclear Science Symposium and Medical Imaging Conference, 1991., Conference Record of the 1991 IEEE
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-0513-2
Type :
conf
DOI :
10.1109/NSSMIC.1991.258884
Filename :
258884
Link To Document :
بازگشت