DocumentCode :
3456777
Title :
Fabrication and characterization of a silicon nanofin non-volatile memory
Author :
Bowoon Soon ; Singh, Navab ; Tsai, Julius Minglin ; Chengkuo Lee
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear :
2013
fDate :
16-20 June 2013
Firstpage :
892
Lastpage :
895
Abstract :
This paper reports the fabrication and characterization of a bi-stable non-volatile device based on nanoelectromechanical system. The device consists of a silicon nanofin (SiNF) of 2, 8, 12 μm length by 90 nm thick which can be switched bi-directionally and achieve two stable geometrical position. After switching, the hysteresis behavior is realized through the nature van der Waals force that holds the SiNF to the surface of the contact terminal. Measurement results show bi-stable hysteresis behavior with pull-in voltage, VPI at 10V and reset voltage, VRESET at -12V. The measured voltage drift of this device is 24mV/°C from 50°C to 150°C.
Keywords :
nanoelectromechanical devices; random-access storage; van der Waals forces; bistable nonvolatile device; fabrication; geometrical position; nanoelectromechanical system; silicon nanofin nonvolatile memory; van der Waals force; Electrodes; Force; Logic gates; Nonvolatile memory; Silicon; Switches; Voltage measurement; NEMS; Nanoelectromechanical system; non-volatile memory; relay; switch; van der Waals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location :
Barcelona
Type :
conf
DOI :
10.1109/Transducers.2013.6626911
Filename :
6626911
Link To Document :
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