DocumentCode
34570
Title
Proposal for Graphene–Boron Nitride Heterobilayer-Based Tunnel FET
Author
Ghosh, Ram Krishna ; Mahapatra, Santanu
Author_Institution
Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
Volume
12
Issue
5
fYear
2013
fDate
Sept. 2013
Firstpage
665
Lastpage
667
Abstract
We investigate the gate-controlled direct band-to-band tunneling (BTBT) current in a graphene-boron nitride (G-BN) heterobilayer channel-based tunnel field effect transistor. We first study the imaginary band structure of hexagonal and Bernal-stacked heterobilayers by density functional theory, which is then used to evaluate the gate-controlled current under the Wentzel-Kramers-Brillouin approximation. It is shown that the direct BTBT is probable for a certain interlayer spacing of the G-BN which depends on the stacking orders.
Keywords
III-V semiconductors; band structure; boron compounds; density functional theory; field effect transistors; graphene; stacking; tunnel transistors; wide band gap semiconductors; BTBT current; Bernal-stacked heterobilayers; C-BN; Wentzel-Kramers-Brillouin approximation; density functional theory; gate-controlled direct band-to-band tunneling current; graphene-boron nitride heterobilayer-based tunnel FET; hexagonal heterobilayers; imaginary band structure; interlayer spacing; stacking orders; tunnel field effect transistor; Graphene; Logic gates; Materials; Photonic band gap; Stacking; Transistors; Tunneling; Band-to-band tunneling; complex band structure; graphene; tunnel field effect transistor (TFET);
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2013.2272739
Filename
6557524
Link To Document