• DocumentCode
    34570
  • Title

    Proposal for Graphene–Boron Nitride Heterobilayer-Based Tunnel FET

  • Author

    Ghosh, Ram Krishna ; Mahapatra, Santanu

  • Author_Institution
    Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
  • Volume
    12
  • Issue
    5
  • fYear
    2013
  • fDate
    Sept. 2013
  • Firstpage
    665
  • Lastpage
    667
  • Abstract
    We investigate the gate-controlled direct band-to-band tunneling (BTBT) current in a graphene-boron nitride (G-BN) heterobilayer channel-based tunnel field effect transistor. We first study the imaginary band structure of hexagonal and Bernal-stacked heterobilayers by density functional theory, which is then used to evaluate the gate-controlled current under the Wentzel-Kramers-Brillouin approximation. It is shown that the direct BTBT is probable for a certain interlayer spacing of the G-BN which depends on the stacking orders.
  • Keywords
    III-V semiconductors; band structure; boron compounds; density functional theory; field effect transistors; graphene; stacking; tunnel transistors; wide band gap semiconductors; BTBT current; Bernal-stacked heterobilayers; C-BN; Wentzel-Kramers-Brillouin approximation; density functional theory; gate-controlled direct band-to-band tunneling current; graphene-boron nitride heterobilayer-based tunnel FET; hexagonal heterobilayers; imaginary band structure; interlayer spacing; stacking orders; tunnel field effect transistor; Graphene; Logic gates; Materials; Photonic band gap; Stacking; Transistors; Tunneling; Band-to-band tunneling; complex band structure; graphene; tunnel field effect transistor (TFET);
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2013.2272739
  • Filename
    6557524