Smoothing sidewalls of a MEMS-based silicon X-ray optics

Author

Moriyama, Takumi ; Ezoe, Yuichiro ; Ogawa, Tomomi ; Ohashi, Takaya ; Kanamori, Yoshiaki ; Mitsuishi, Ikuyuki ; Mita, M. ; Mitsuda, Kazuhisa ; Maeda, Atsushi

Author_Institution

Dept. of Phys., Tokyo Metropolitan Univ., Tokyo, Japan

fYear

2011

fDate

8-11 Aug. 2011

Firstpage

205

Lastpage

206

Abstract

X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.

Keywords

X-ray astronomy; X-ray optics; annealing; astronomical telescopes; micro-optomechanical devices; optical fabrication; silicon; sputter etching; surface roughness; MEMS-based silicon X-ray optics; angular resolution; annealing; astronomical missions; dry etching; smoothing sidewalls; surface roughness; Annealing; Mirrors; Optical device fabrication; Optical imaging; Silicon; X-ray imaging; DRIE; X-ray; optics; space mission;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OMN), 2011 International Conference on

Conference_Location

Istanbul

ISSN

2160-5033

Print_ISBN

978-1-4577-0334-8

Type

conf

DOI

10.1109/OMEMS.2011.6031043

Filename

6031043