DocumentCode :
3461693
Title :
Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors
Author :
Ogawa, Tomomi ; Ezoe, Yuichiro ; Moriyama, Takumi ; Ohashi, Takaya ; Kanamori, Yoshiaki ; Mitsuishi, Ikuyuki ; Mitsuda, Kazuhisa ; Yamaguchi, Hitoshi ; Riveros, R.
Author_Institution :
Dept. of Phys., Tokyo Metropolitan Univ., Tokyo, Japan
fYear :
2011
fDate :
8-11 Aug. 2011
Firstpage :
167
Lastpage :
168
Abstract :
A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al Kα 1.49 keV.
Keywords :
X-ray optics; angular measurement; elemental semiconductors; micro-optomechanical devices; micromirrors; optical variables measurement; reflectivity; silicon; MEMS-based silicon mirrors; Si; X-ray beam; X-ray reflectivity measurement; electron volt energy 1.49 keV; taper angle measurement; Annealing; Educational institutions; Extraterrestrial measurements; Mirrors; Photonics; Semiconductor device measurement; Silicon; DRIE; X-ray optics; annealing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2011 International Conference on
Conference_Location :
Istanbul
ISSN :
2160-5033
Print_ISBN :
978-1-4577-0334-8
Type :
conf
DOI :
10.1109/OMEMS.2011.6031068
Filename :
6031068
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3461693
بازگشت