DocumentCode
3462467
Title
Temperature impact on the lorentzian noise induced by electron valance band tunneling in partiallydepleted SOI nMOSFETs
Author
Guo, W. ; Cretu, B. ; Routoure, J.M. ; Carin, R. ; Simoen, E. ; Claeys, C.
Author_Institution
GREYC, Caen
fYear
2006
fDate
Oct. 2006
Firstpage
58
Lastpage
60
Abstract
In this paper, the temperature impact on the Lorentzian noise induced by electron valence band tunneling (EVB) is analyzed for partially depleted SOI MOSFETs. In (Lukyanchikova et al., 2003) and (Lukyanchikova et al., 2004) the Lorentzian noise parameters were already studied at 300K and a model based on shot noise of the EVB tunneling current was proposed. The aim of this paper is to investigate the Lorentzian time constant tau and the plateau amplitude of the gate voltage noise spectral density SVG (0) variation versus temperature, where SVG (0) = SI (0)/(gm)2 . It is observed that from 300K down to 80K tau and SVG (0) exhibit behaviors in agreement with the existing model (Lukyanchikova et al., 2003) and (Lukyanchikova et al., 2004)
Keywords
MOSFET; semiconductor device models; silicon-on-insulator; tunnelling; valence bands; 300 K; 80 K; Lorentzian noise parameters; Lorentzian time constant; electron valence band tunneling; gate voltage noise spectral density; nMOSFET; partially depleted SOI; plateau amplitude; temperature impact; tunneling current; Decision support systems; Electrons; MOSFETs; Quadratic programming; Temperature; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306076
Filename
4098020
Link To Document