• DocumentCode
    3462467
  • Title

    Temperature impact on the lorentzian noise induced by electron valance band tunneling in partiallydepleted SOI nMOSFETs

  • Author

    Guo, W. ; Cretu, B. ; Routoure, J.M. ; Carin, R. ; Simoen, E. ; Claeys, C.

  • Author_Institution
    GREYC, Caen
  • fYear
    2006
  • fDate
    Oct. 2006
  • Firstpage
    58
  • Lastpage
    60
  • Abstract
    In this paper, the temperature impact on the Lorentzian noise induced by electron valence band tunneling (EVB) is analyzed for partially depleted SOI MOSFETs. In (Lukyanchikova et al., 2003) and (Lukyanchikova et al., 2004) the Lorentzian noise parameters were already studied at 300K and a model based on shot noise of the EVB tunneling current was proposed. The aim of this paper is to investigate the Lorentzian time constant tau and the plateau amplitude of the gate voltage noise spectral density SVG (0) variation versus temperature, where SVG (0) = SI (0)/(gm)2 . It is observed that from 300K down to 80K tau and SVG (0) exhibit behaviors in agreement with the existing model (Lukyanchikova et al., 2003) and (Lukyanchikova et al., 2004)
  • Keywords
    MOSFET; semiconductor device models; silicon-on-insulator; tunnelling; valence bands; 300 K; 80 K; Lorentzian noise parameters; Lorentzian time constant; electron valence band tunneling; gate voltage noise spectral density; nMOSFET; partially depleted SOI; plateau amplitude; temperature impact; tunneling current; Decision support systems; Electrons; MOSFETs; Quadratic programming; Temperature; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306076
  • Filename
    4098020