DocumentCode :
3462492
Title :
Impact of improved mobility and low flicker noise MOS transistors using accumulation mode fully depleted silicon-on-insulator devices
Author :
Cheng, Weitao ; Teramoto, Akinobu ; Gaubert, Philippe ; Hirayama, Masaki ; Ohmi, Tadahiro
Author_Institution :
New Ind. Creation Hatchery Center, Tohoku Univ., Sendai
fYear :
2006
fDate :
Oct. 2006
Firstpage :
65
Lastpage :
67
Abstract :
Improved mobility and low flicker noise device characteristics of fully depleted silicon-on-insulator (FD-SOI) MOSFETs are focused in this paper, using normally off accumulation mode device structures. It is demonstrated that the current drivabilities of both accumulation mode FD-SOI n-and p-MOSFETs are improved above 1.3 times compared with inversion mode MOSFETs. The effective mobilities of accumulation mode MOSFETs are improved because of the lower effective electric field at the same gate bias and the bulk current components. The flicker noise characteristics in both accumulation mode FD-SOI n- and p-MOSFETs are about 1 digit lower compared with the inversion mode MOSFETs and show the SOI layer doping concentration dependences
Keywords :
MOSFET; doping; electric fields; flicker noise; silicon-on-insulator; MOS transistors; SOI layer doping concentration; flicker noise; fully depleted silicon-on-insulator devices; lower effective electric field; n-MOSFET; normally off accumulation mode device structures; p-MOSFET; 1f noise; Analog integrated circuits; Analog-digital conversion; Analog-digital integrated circuits; Doping; Electrodes; Integrated circuit noise; MOSFET circuits; Oxidation; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306078
Filename :
4098022
Link To Document :
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