DocumentCode :
3466492
Title :
Discussion on the CHE Programming Characteristics with the Scaling Down of Charge Trapping Flash Memory
Author :
Sun, Lei ; Pan, Liyang ; Luo, Xian ; Wu, Dong ; Zhu, Jun
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing
fYear :
2006
fDate :
23-26 Oct. 2006
Firstpage :
824
Lastpage :
826
Abstract :
The scaling down issues in the charge trapping memory are investigated in this work. In the sub-100 nm devices, the punch-through problem, as well as high program voltage and electrical field limitation are studied by device simulation and measurement. The authors found CHE program mechanism meet certain limitation in the future short channel devices. Furthermore, program induced charge distribution is extracted by a charge pumping method, and the related problems to the multi-bit application is discussed
Keywords :
flash memories; hot carriers; CHE programming; channel hot electrons; charge distribution; charge pumping; charge trapping; device simulation; flash memory; punch-through problem; CMOS technology; Channel hot electron injection; Flash memory; Microelectronics; Nonvolatile memory; Random access memory; SONOS devices; Sun; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306519
Filename :
4098246
Link To Document :
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