• DocumentCode
    3466965
  • Title

    Comparison of Nonlinear I-V Models for Submicron GaAs MESFET´s Characteristics

  • Author

    Memon, N.M. ; Ahmed, M.M. ; Rehman, F.

  • Author_Institution
    Dept. of Electron. Eng., M. A. Jinnah Univ., Islamabad
  • fYear
    2006
  • fDate
    23-26 Oct. 2006
  • Firstpage
    896
  • Lastpage
    898
  • Abstract
    A comparison of nine different nonlinear I-V models for the simulation of submicron GaAs MESFETs dc characteristics has been made. The drain-to-source current, Ids as a function of gate-to-source, Vgs and drain-to-source, Vds voltages has been simulated and then compared with experimental data to determine root-mean-square (RMS) errors. The lowest RMS error was observed in Ahmed model whereas the highest RMS error was seen in Statz model. It has been shown that for submicron devices only those models can predict the device characteristics, with reasonable accuracy, which take into account short channel effects in their modeling parameters
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; semiconductor device models; Ahmed model; GaAs; Statz model; nonlinear I-V models; root-mean-square errors; short channel effects; submicron MESFET; submicron device simulation; Circuit simulation; Computational modeling; Gallium arsenide; Intrusion detection; MESFETs; Mathematical model; Numerical models; Predictive models; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306564
  • Filename
    4098269