DocumentCode
3466965
Title
Comparison of Nonlinear I-V Models for Submicron GaAs MESFET´s Characteristics
Author
Memon, N.M. ; Ahmed, M.M. ; Rehman, F.
Author_Institution
Dept. of Electron. Eng., M. A. Jinnah Univ., Islamabad
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
896
Lastpage
898
Abstract
A comparison of nine different nonlinear I-V models for the simulation of submicron GaAs MESFETs dc characteristics has been made. The drain-to-source current, Ids as a function of gate-to-source, Vgs and drain-to-source, Vds voltages has been simulated and then compared with experimental data to determine root-mean-square (RMS) errors. The lowest RMS error was observed in Ahmed model whereas the highest RMS error was seen in Statz model. It has been shown that for submicron devices only those models can predict the device characteristics, with reasonable accuracy, which take into account short channel effects in their modeling parameters
Keywords
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; semiconductor device models; Ahmed model; GaAs; Statz model; nonlinear I-V models; root-mean-square errors; short channel effects; submicron MESFET; submicron device simulation; Circuit simulation; Computational modeling; Gallium arsenide; Intrusion detection; MESFETs; Mathematical model; Numerical models; Predictive models; Threshold voltage; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306564
Filename
4098269
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