DocumentCode :
3467434
Title :
Study on Photocatalytic Activity of Ni2+ Doped TiO2 Thin Films
Author :
Gao Song-Hua ; Gao Li-Hua ; Zhou Ke-Sheng
Author_Institution :
Dept. of Phys., Mech. & Electr. Eng., Sanming Univ., Sanming, China
fYear :
2010
fDate :
7-9 Nov. 2010
Firstpage :
1
Lastpage :
3
Abstract :
For the sake of improving the self-cleaning performance of the ceramic insulator, TiO2 thin films and Ni2+ doped TiO2 thin films were prepared by sol-gel method. The crystalline phase and morphology was studied by analyzing XRD and AFM. The film´s photocatalytic property was tested according to degradation of methyl orange solution. The results indicate that the film photocatalytic property decreases slightly when the TiO2 thin films were doped with Ni2+. It is suggested that the introduction of nickel ions actually added compound spaces of photo-generated carrier in the TiO2 thin film surface, leading to the recombination rate of electron hole pair increasing.
Keywords :
X-ray diffraction; atomic force microscopy; catalysis; electron-hole recombination; photochemistry; sol-gel processing; thin films; AFM; TiO2:Ni2+; XRD; ceramic insulator; crystalline phase; methyl orange solution; morphology; nickel ions; photo-generated carrier; photocatalytic activity; sol-gel method; thin films; Degradation; Ions; Morphology; Nickel; Photochemistry; Physics; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
E-Product E-Service and E-Entertainment (ICEEE), 2010 International Conference on
Conference_Location :
Henan
Print_ISBN :
978-1-4244-7159-1
Type :
conf
DOI :
10.1109/ICEEE.2010.5660420
Filename :
5660420
Link To Document :
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