DocumentCode :
3468980
Title :
Study of CF4 capacitive plasma chemistry through mass spectrometry technique and global model
Author :
Toneli, David A. ; Pessoa, R.S. ; Roberto, Marisa ; Petraconi, Gilberto ; Maciel, H.S.
Author_Institution :
Technol. Inst. of Aeronaut., São José dos Campos, Brazil
fYear :
2013
fDate :
16-21 June 2013
Firstpage :
1
Lastpage :
4
Abstract :
In this work the chemistry of CF4 capacitive plasma is studied. For this, experimental measurements were made by mass spectrometry technique which allowed the analysis of neutral species generated during the fragmentation of the source gas by the electrical gas discharge. Additionally, we use global model simulations in order to complement the experimental results, allowing to discern the main chemical processes occurring in the CF4 plasma. The global model developed here considers the main chemical reactions in CF4 plasma: momentum transfer, vibrational, ionization, dissociation, electron attachment and loss, recombination between charged and neutral species in the gas phase and the reactor walls.
Keywords :
discharges (electric); dissociation; electron attachment; ionisation; mass spectroscopic chemical analysis; organic compounds; plasma chemistry; plasma simulation; plasma-wall interactions; capacitive plasma chemistry; charged-neutral species recombination; chemical processes; chemical reactions; dissociation; electrical gas discharge; electron attachment; electron loss; gas phase; global model simulations; ionization; mass spectrometry; momentum transfer; reactor walls; source gas fragmentation; vibration; Chemistry; Discharges (electric); Equations; Inductors; Ions; Plasma measurements; Plasmas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Conference (PPC), 2013 19th IEEE
Conference_Location :
San Francisco, CA
ISSN :
2158-4915
Type :
conf
DOI :
10.1109/PPC.2013.6627595
Filename :
6627595
Link To Document :
بازگشت