Title :
The art of sampling reduction
Author :
Keung Hui ; Mou, Jinyu
Author_Institution :
Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan
Abstract :
This paper examines impacts of metrology delays on the system performances of advanced process control solutions in semiconductor manufacturing. The analysis establishes a first step in any assessment of sampling reduction, a persistent notion amid the relentless drives of cutting production costs. We show that metrology delays deteriorate system performances with increased variances but retain system stability at large. The task on sampling reduction is finally casted as an art of business decision.
Keywords :
cost reduction; measurement; process control; sampling methods; semiconductor device manufacture; metrology delay; process control solutions; production cost cutting; sampling reduction; semiconductor manufacturing; Art; Delays; advanced process control; gain mismatch; metrology delay; system stability;
Conference_Titel :
e-Manufacturing & Design Collaboration Symposium (eMDC), 2013
Conference_Location :
Hsinchu
DOI :
10.1109/eMDC.2013.6756047
