Title :
Preparation and characterisation of exfoliated graphene for quantum resistance metrology
Author :
Rietveld, G. ; van Elferen, H.J. ; Giesbers, A.J.M. ; Veligura, A. ; Zeitler, U. ; Novoselov, K.S. ; van Wees, B.J. ; Geim, A.K. ; Maan, J.C.
Author_Institution :
Van Swinden Lab. (VSL), Netherlands
Abstract :
Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.
Keywords :
contact resistance; graphene; C; contact resistances; exfoliated graphene; quantum resistance metrology; Annealing; Chromium; Electrical resistance measurement; Electrons; Gold; Laboratories; Metrology; Optical microscopy; Physics; Temperature;
Conference_Titel :
Precision Electromagnetic Measurements (CPEM), 2010 Conference on
Conference_Location :
Daejeon
Print_ISBN :
978-1-4244-6795-2
DOI :
10.1109/CPEM.2010.5544190
