DocumentCode :
3475310
Title :
Effect of Photo Misalignment on N-LDMOS Hot Carrier Device Reliability
Author :
Brisbin, Douglas ; Lindorfer, Philipp ; Chaparala, Prasad
Author_Institution :
National Semicond. Corp., Santa Clara, CA
fYear :
2006
fDate :
Oct. 16 2006-Sept. 19 2006
Firstpage :
44
Lastpage :
48
Abstract :
Power management devices often require operation in the 20 V to 30 V range. A common choice for the power MOS driver is an n-channel lateral DMOS (N-LDMOS) device. An advantage of N-LDMOS device is that it can easily be integrated within existing technologies to handle a wide range of operating voltages without significant process changes. Because of the high voltages applied to the N-LDMOS device hot carrier (HC) degradation is a real reliability concern. In high power applications N-LDMOS devices are often implemented in transistor arrays where the basic cell is a dual gate single drain device. This paper focuses on understanding unusual N-LDMOS HC results in which single gate devices had significantly better HC performance than dual gate devices
Keywords :
MIS devices; hot carriers; semiconductor device reliability; N-LDMOS hot carrier device reliability; dual gate single drain device; photo misalignment effect; transistor arrays; CMOS technology; Degradation; Displays; Energy management; Hot carriers; Mirrors; Semiconductor device reliability; Stress; Switches; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2006 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
1-4244-0296-4
Electronic_ISBN :
1930-8841
Type :
conf
DOI :
10.1109/IRWS.2006.305208
Filename :
4098685
Link To Document :
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