DocumentCode :
3475448
Title :
Reliability issues related to Fast Charge Loss Mechanism in Embedded Non Volatile Memories
Author :
Mora, Pascal ; Renard, Sophie ; BOSSU, Germain ; Waltz, Patrice ; Pananakakis, George ; Ghibaudo, Gerard
Author_Institution :
STMicroelectronics, Crolles
fYear :
2006
fDate :
Oct. 16 2006-Sept. 19 2006
Firstpage :
68
Lastpage :
72
Abstract :
In this work, we report on a thorough study of charge loss in embedded non volatile memories. We focused on the fast initial threshold voltage (Vth) shift, which occurs during the first minutes of data retention bake. Experiments were performed to have a better understanding of this phenomenon. As a result, we can predict the Vth shift of a cell baked at 250degC and evaluate its impact on product reliability. This is the first time that this reliability aspect is characterized with such a level of accuracy. Based on these observations, a physical model is proposed to describe the fast initial threshold voltage shift
Keywords :
random-access storage; semiconductor device reliability; 250 C; embedded non volatile memories; fast charge loss mechanism; fast initial threshold voltage shift; product reliability; reliability issues; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2006 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
1-4244-0296-4
Electronic_ISBN :
1930-8841
Type :
conf
DOI :
10.1109/IRWS.2006.305213
Filename :
4098690
Link To Document :
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