DocumentCode :
3476119
Title :
Frequency-dependent reluctance extraction
Author :
Luk, C. ; Tsung-Hao Chen ; Chen, C.C.-P.
Author_Institution :
Optimal corporation
fYear :
2004
fDate :
27-30 Jan. 2004
Firstpage :
793
Lastpage :
798
Abstract :
A new methodology is presented to captiire high frequency effects of interconnect, namely skin and proximity by using the reluctance (inverse inductance) method. As demonstrated in numerous publications that the reluctance method exhibits excellent locality and suitability of sparsification. The reluctance method results in great benefit in terms of efficiency of extraction and simulation. Mast of the previous studies described the reluctance extraction method without t,aking frequency dependent effects into consideration. In this paper, we first show the differences in frequency response between formula-based inductance extraction and frequency dependent inductance extraction to demonstrate the need to capture high frequency effect. Then a novel frequency dependent reluctance extraction method is proposed by using a robust windowing policy, which is able to handle irregular geometries in VLSI applications. Experimental results demonstrate the superior runtime and accuracy over traditional partial inductance extraction.
Keywords :
Conductors; Equivalent circuits; Frequency dependence; Frequency response; Inductance; Integrated circuit interconnections; Proximity effect; Signal design; Skin; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2004. Proceedings of the ASP-DAC 2004. Asia and South Pacific
Conference_Location :
Yohohama, Japan
Print_ISBN :
0-7803-8175-0
Type :
conf
DOI :
10.1109/ASPDAC.2004.1337702
Filename :
1337702
Link To Document :
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