Compact model and projection of silicon nanowire tunneling transistors (NW-tFETs)

We present in this paper a basic compact model incorporating several key physical mechanisms in nanowire tunneling field-effect transistors (NW-tFETs), such as non-constant subthreshold swing (SS), definition of an on voltage, ballistic transport for carriers in the channel, and quantum capacitance limit (QCL). Using experimental data from [1], the validity of this model is verified. Further, to project the performance of ultra-scaled silicon NW-tFETs, we compare the state-of-the-art gate-all-around (GAA) NW MOSFETs [2] with modeling results for the same NW diameter and EOT (effective oxide thickness). It is concluded that ultra-scaled NW-tFETs can achieve high performance with low subthreshold swing (SS) and nearly the same on current as in MOSFETs.