Title :
Production implant monitoring using the Therma-Probe 500
Author :
Pearce, Nick ; Zhou, Li ; Graves, Phillip ; Takeo, Hiroshi ; Romig, Terry
Author_Institution :
Therma-Wave Inc., Fremont, CA, USA
Abstract :
This paper introduces a new implant monitoring tool, the Therma-Probe 500 (TP500), capable of fully automated real-time measurements on product wafers. This new Therma-Probe combines a 100% increase in throughput with a state-of-the-art pattern recognition system to enable quick and effortless location and measurement of sites as small as 10 μm×10 μm anywhere on product wafers. This paper also demonstrates that the new TP500 system has excellent sensitivity in monitoring implant dose and energy
Keywords :
integrated circuit measurement; ion implantation; monitoring; pattern recognition equipment; production testing; Therma-Probe 500; fully automated real-time measurements; implant dose; implant energy; pattern recognition system; product wafers; production implant monitoring; sensitivity; Condition monitoring; Implants; Plasma measurements; Plasma waves; Process control; Production; Solid lasers; Testing; Throughput; Time measurement;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586185
