DocumentCode :
3480953
Title :
Energy values of very low-energy ion beams
Author :
Sakudo, N. ; Hayashi, K. ; Yukishiro, Y.
Author_Institution :
Kanazawa Inst. of Technol., Ishikawa, Japan
fYear :
1996
fDate :
16-21 Jun 1996
Firstpage :
327
Lastpage :
330
Abstract :
Ion beams of energy levels less than 100 eV are used to form special films with excellent physical and chemical properties. However, their energy values are inaccurate unless the plasma potentials are taken into account with their total energies. For simple plasmas which consist of singly-charged ions of a single species and electrons of a single electron temperature, we have formerly reported how to obtain accurate values. In this paper, we further investigate the exact energy values for a source plasma having double electron temperatures as is often the case with industrially used ion sources
Keywords :
energy measurement; ion beams; particle beam diagnostics; particle beam extraction; plasma diagnostics; plasma temperature; 50 to 100 eV; double electron temperatures; energy values; ion beam deposition; plasma potentials; source plasma; very low-energy ion beams; Chemicals; Electrons; Energy states; Ion beams; Ion sources; Plasma applications; Plasma chemistry; Plasma properties; Plasma sources; Plasma temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
Type :
conf
DOI :
10.1109/IIT.1996.586275
Filename :
586275
Link To Document :
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