Title :
Metal rework yield loss-mechanisms and solutions
Author :
Shields, Jcffrcy A. ; Ko, Kclwin ; Rios, Rosalinda ; Mercado, Lcobardo
Author_Institution :
Adv. Micro Devices Inc., Sunnyvale, CA, USA
Abstract :
Metal mask rework has been demonstrated to have a dramatic effect on product yield. We have undertaken an exhaustive study to determine the mechanisms behind the yield loss and to develop a benign metal mask rework solution. We have identified two separate mechanisms for potential yield loss associated with metal mask rework; copper precipitation from high temperature plasma strip and chemical penetration of thin TiN ARC layers
Keywords :
masks; TiN ARC layer; chemical penetration; copper precipitation; high temperature plasma strip; metal mask rework; product yield loss; semiconductor process technology; Aluminum alloys; Artificial intelligence; Copper alloys; Displays; Etching; Heating; Resists; Solids; Strips; Titanium alloys;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808758
