Configurations of laser interference lithography for 2D/3D nanostructures of optical functional materials

This paper presents various methods of multi-beam laser interference lithography to form dense periodical nanostructures suitable for many optical functional materials or devices. Research results show that 2D and 3D inference patterns could be generated cheaply and easily by exposing the photosensitive materials using the periodically changed light intensity distributions of multi-beam interference fields. Different configurations of multi-beam interference setups are introduced. Simulation and experimental results are also obtained. It can be seen that the experimental results are in accordance with the physical principle, and the simulation results have also given the expected results clearly.