DocumentCode
348203
Title
Experiments on radiation induced effects in the Si/SiO2 system
Author
Codreanu, Cecilia ; Iliescu, Elena ; Badoiu, Aritina ; Dragan, M.
Author_Institution
Nat. Inst. for Res. & Dev. in Microtechnol., Bucharest, Romania
Volume
1
fYear
1999
fDate
1999
Firstpage
239
Abstract
This paper presents the results of an experimental study on MOS capacitor test structures with different oxide thickness and exposed to different irradiation conditions and post-irradiation annealing treatments. Test samples were fabricated on N-type silicon wafers of ⟨111⟩ orientation and 5-10 Ω cm resistivity. Irradiation was performed at different temperatures in a 7 MeV linear electron accelerator
Keywords
MOS capacitors; annealing; electron beam effects; elemental semiconductors; semiconductor-insulator boundaries; silicon; silicon compounds; 7 MeV; MOS capacitor; Si-SiO2; Si/SiO2 interface; annealing; electron irradiation; Annealing; Electron accelerators; Laser theory; MOS capacitors; Physics; Plasma temperature; Radiation effects; Research and development; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 1999. CAS '99 Proceedings. 1999 International
Conference_Location
Sinaia
Print_ISBN
0-7803-5139-8
Type
conf
DOI
10.1109/SMICND.1999.810506
Filename
810506
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