• DocumentCode
    3483145
  • Title

    Photoluminescence, raman and X-ray diffraction studies of porous GaN grown on sapphire

  • Author

    Mahmood, AAinorkhilah ; Hassan, Zainuriah ; Kwong, Yam Fong ; Siang, Chuah Lee ; Yunus, Mohd Bukhari Md

  • Author_Institution
    Nano-Optoelectron. Res. & Technol. Lab., Univ. Sains Malaysia, Minden, Malaysia
  • fYear
    2011
  • fDate
    5-6 Dec. 2011
  • Firstpage
    677
  • Lastpage
    681
  • Abstract
    In this study, we have investigated the structural and optical properties of porous GaN films on sapphire (0001) prepared by UV assisted electrochemical etching. Scanning electron microscopy (SEM) and high resolution X-ray diffraction (HR-XRD) measurements reveal the nature of the pore morphology and microstructures. The optical properties of porous GaN samples have been studied by photoluminescence (PL) and Raman spectroscopy. SEM micrographs indicated that the average pore size for samples was around 0.16 to 0.43 μm. XRD revealed that the broadening in spectrum is due to the small size crystallites. As compared to the as-grown GaN films, porous layers exhibit a substantial photoluminescence (PL) intensity enhancement with red-shifted band- edge PL peaks associated with the relaxation of compressive stress. The shift of E2 (high) to the lower frequency in Raman spectra of the porous GaN films further confirms such a stress relaxation.
  • Keywords
    III-V semiconductors; Raman spectra; X-ray diffraction; compressive strength; crystallites; etching; gallium compounds; photoluminescence; porosity; porous semiconductors; red shift; scanning electron microscopy; stress relaxation; wide band gap semiconductors; Al2O3; GaN; HR-XRD; Raman spectra; SEM; UV assisted electrochemical etching; compressive stress relaxation; crystallites; high resolution X-ray diffraction; microstructures; optical properties; photoluminescence; pore morphology; pore size; porous films; red shift; sapphire (0001) surface; scanning electron microscopy; size 0.16 mum to 0.43 mum; structural properties; Etching; Gallium nitride; Optical diffraction; Optical films; Raman scattering; Scanning electron microscopy; High Resolution X-ray Diffraction (HRXRD); Photoluminiscence; Porous GaN; Raman Spectroscopy; Scanning Electron Microscopy (SEM);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Humanities, Science and Engineering (CHUSER), 2011 IEEE Colloquium on
  • Conference_Location
    Penang
  • Print_ISBN
    978-1-4673-0021-6
  • Type

    conf

  • DOI
    10.1109/CHUSER.2011.6163819
  • Filename
    6163819