On board statistical process control on the NV-GSD series ion implanter

Author

Sedgewick, Judith E. ; Franceschelli, A.J. ; Hazelton, Jim ; Malenfant, J.

Author_Institution

Semicond. Equipment Div., Eaton Corp., Beverly, MA, USA

fYear

1996

fDate

16-21 Jun 1996

Firstpage

501

Lastpage

504

Abstract

Statistical Process Control has had increasing popularity in the manufacturing environment in recent years. SPC is the process of collecting information that is indicative of the health of the equipment and or process. Analysis of the data can determine the normal operating parameters of a machine or process and deviations from the norm. Long term operating trends can also be detected. This data collection and analysis technique has proven extremely useful on a high current ion implanter in a semiconductor fabrication facility. The on-board Statistical Process Control option is available on the NV-GSD200 series implanter as well as the NV-GSD/HE implanter. The SPC package provides a user friendly method to look for process trends or machine parameter changes that would otherwise be difficult to monitor. This paper will discuss the fundamentals of the SPC package and its application in a semiconductor fabrication facility

Keywords

ion implantation; statistical process control; NV-GSD series; data analysis; data collection; high current ion implanter; on-board statistical process control; semiconductor fabrication; Computerized monitoring; Condition monitoring; Data analysis; Databases; Fabrication; Helium; Implants; Packaging machines; Process control; Semiconductor device packaging;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology. Proceedings of the 11th International Conference on

Conference_Location

Austin, TX

Print_ISBN

0-7803-3289-X

Type

conf

DOI

10.1109/IIT.1996.586413

Filename

586413