• DocumentCode
    3489112
  • Title

    Realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching

  • Author

    Teo, H.G. ; Yu, M.B. ; Singh, J. ; Ranga, N. ; Li, J. ; Yew, W.C. ; Liu, A.Q.

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
  • fYear
    2004
  • fDate
    28-30 June 2004
  • Abstract
    In this paper realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching. Sidewall scallops that determines the roughness on the nanopillars were also investigated for the different height and depths obtained through varying process parameters.
  • Keywords
    nanostructured materials; photonic band gap; photonic crystals; sputter etching; aspect ratio; deep reactive ion etching; nanopillars roughness; photonic crystal; process parameters; sidewall scallops; Circuits; Etching; Fabrication; Frequency; Lattices; Nanostructures; Optical control; Optical devices; Photonic band gap; Photonic crystals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004 Digest of the LEOS Summer Topical Meetings
  • ISSN
    1099-4742
  • Print_ISBN
    0-7803-8306-0
  • Type

    conf

  • DOI
    10.1109/LEOSST.2004.1338718
  • Filename
    1338718
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3489112