Title :
248 nm lithography of 2D photonic crystal waveguide with proximity correction
Author :
Teo, H.G. ; Yu, M.B. ; Doan, M.T. ; Singh, J. ; Singh, S. ; Sun, H.Q. ; Liu, A.Q.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
Abstract :
This paper addresses the specific issue of optical proximity correction (OPC) used in large array pillar type two-dimensional photonic crystal fabrication by deep UV lithography for a nonsequential technique amenable for batch fabrication.
Keywords :
masks; nanolithography; optical fabrication; optical waveguides; photonic crystals; proximity effect (lithography); ultraviolet lithography; 248 nm; 2D photonic crystal waveguide lithography; array pillar type two-dimensional photonic crystal fabrication; batch fabrication; deep UV lithography; mask bias; nonsequential technique; optical proximity errors; proximity correction; resolution enhancement techniques; Electron optics; Finite difference methods; Lithography; Optical crosstalk; Optical device fabrication; Optical sensors; Optical waveguides; Photonic crystals; Throughput; Tunneling;
Conference_Titel :
Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004 Digest of the LEOS Summer Topical Meetings
Print_ISBN :
0-7803-8306-0
DOI :
10.1109/LEOSST.2004.1338720
