Title :
Performance properties in thick film silicate dielectric layers using molecular modeling
Author :
Iwamoto, Nancy ; Krishnamoorthy, Ahila ; Spear, Richard ; Brouk, Emma ; Gebrebrhan, Amanuel ; Stifanos, Mehari ; Rutter, Ed ; Yellowaga, Deb
Author_Institution :
Honeywell UOP, Ramona, CA
Abstract :
Molecular modeling was employed to understand various properties found in thick film dielectric layers derived from solution-based sol-gel formulation in order to aid their development. For instance, for formulations used as planarizing layers, it was discovered that during certain process steps ionic components could be introduced which greatly influences the extent of shrinkage by up to 50%, a phenomenon not normally seen in traditional spin-on glasses (SOG). Thermodynamic calculations showed that specific ionic contaminants contribute to the cure state of the material, potentially depolymerizing the material and promoting the formation of structures that are more easily deformed. Volumetric analysis and compaction modeling demonstrated that the high extent of shrinkage is expected, depending upon the final structure of the silicate. Calculation of the relative modulus of the different suspected structures also showed that depolymerized structures contribute to the ease of compaction.
Keywords :
dielectric materials; dielectric properties; sol-gel processing; thermodynamic properties; thick films; compaction modeling; ionic components; ionic contaminants; molecular modeling; performance properties; solution-based sol-gel formulation; spin-on glasses; thermodynamic calculations; thick film dielectric layers; thick film silicate dielectric layers; volumetric analysis; Compaction; Dielectric films; Dielectric materials; Dielectric measurements; Optical films; Pollution measurement; Semiconductor device modeling; Silicon; Thermodynamics; Thick films;
Conference_Titel :
Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems, 2008. EuroSimE 2008. International Conference on
Conference_Location :
Freiburg im Breisgau
Print_ISBN :
978-1-4244-2127-5
Electronic_ISBN :
978-1-4244-2128-2
DOI :
10.1109/ESIME.2008.4525101