• DocumentCode
    349253
  • Title

    Mg diffusion formed p-type GaN

  • Author

    Yen, Jia-Liang ; Shyang, Fuh ; Yang, Ying-Jay

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    35
  • Abstract
    Summary form only given. In the development of GaN and related nitride compound, using Mg doping to form a p-type GaN plays a critical role for making green-to-blue light emitting devices. Despite of the progress in the in-situ Mg doping process, the conventional post-growth doping techniques, such as the diffusion process to achieve higher hole concentration for better p-type ohmic contact or device operation, haven´t been successfully demonstrated yet. Also due to the lack of reliable process the diffusion properties of Mg, which may affect the device structure and operation, still remain unknown. In this paper, we report on Mg diffusion into unintentionally doped n-type GaN resulting in p-type GaN formation
  • Keywords
    III-V semiconductors; diffusion; gallium compounds; light emitting devices; optical fabrication; semiconductor doping; GaN:Mg; Mg diffusion; Mg diffusion formed p-type GaN; diffusion properties; green-to-blue light emitting devices; optical fabrication; p-type GaN formation; post-growth doping techniques; reliable process; semiconductor doping; unintentionally doped n-type GaN; Annealing; Diffusion processes; Doping; Etching; Furnaces; Gallium nitride; Human computer interaction; MOCVD; Ohmic contacts; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    LEOS '99. IEEE Lasers and Electro-Optics Society 1999 12th Annual Meeting
  • Conference_Location
    San Francisco, CA
  • ISSN
    1092-8081
  • Print_ISBN
    0-7803-5634-9
  • Type

    conf

  • DOI
    10.1109/LEOS.1999.813463
  • Filename
    813463