DocumentCode
349253
Title
Mg diffusion formed p-type GaN
Author
Yen, Jia-Liang ; Shyang, Fuh ; Yang, Ying-Jay
Author_Institution
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume
1
fYear
1999
fDate
1999
Firstpage
35
Abstract
Summary form only given. In the development of GaN and related nitride compound, using Mg doping to form a p-type GaN plays a critical role for making green-to-blue light emitting devices. Despite of the progress in the in-situ Mg doping process, the conventional post-growth doping techniques, such as the diffusion process to achieve higher hole concentration for better p-type ohmic contact or device operation, haven´t been successfully demonstrated yet. Also due to the lack of reliable process the diffusion properties of Mg, which may affect the device structure and operation, still remain unknown. In this paper, we report on Mg diffusion into unintentionally doped n-type GaN resulting in p-type GaN formation
Keywords
III-V semiconductors; diffusion; gallium compounds; light emitting devices; optical fabrication; semiconductor doping; GaN:Mg; Mg diffusion; Mg diffusion formed p-type GaN; diffusion properties; green-to-blue light emitting devices; optical fabrication; p-type GaN formation; post-growth doping techniques; reliable process; semiconductor doping; unintentionally doped n-type GaN; Annealing; Diffusion processes; Doping; Etching; Furnaces; Gallium nitride; Human computer interaction; MOCVD; Ohmic contacts; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
LEOS '99. IEEE Lasers and Electro-Optics Society 1999 12th Annual Meeting
Conference_Location
San Francisco, CA
ISSN
1092-8081
Print_ISBN
0-7803-5634-9
Type
conf
DOI
10.1109/LEOS.1999.813463
Filename
813463
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