Title :
Selective MOVPE technique and its applications for photonic devices
Author_Institution :
Optoelectron. & High-Frequency Device Res. Lab., NEC Corp., Ibaraki, Japan
fDate :
Aug. 30 1999-Sept. 3 1999
Abstract :
The selective growth technique on a mask-patterned planar substrate has attracted much attention because it enables simple integration of thickness-tapered waveguides as well as bandgap-energy control in waveguide layers. Moreover, narrow-stripe selective MOVPE enables the formation of active/passive waveguide layers without a mesa-etching process, which is an attractive approach to the fabrication of photonic devices. The paper reviews this technique, and discusses several device applications.
Keywords :
MOCVD; energy gap; optical fabrication; optical planar waveguides; optical waveguide components; reviews; vapour phase epitaxial growth; active/passive waveguide layers; bandgap-energy control; device applications; fabrication; mask-patterned planar substrate; narrow-stripe selective MOVPE; photonic devices; reviews; selective MOVPE technique; selective growth technique; simple integration; thickness-tapered waveguides; waveguide layers; Electrons; Epitaxial growth; Epitaxial layers; Optical device fabrication; Optical modulation; Optical surface waves; Optical waveguides; Planar waveguides; Quantum well devices; Thickness control;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location :
Seoul, South Korea
Print_ISBN :
0-7803-5661-6
DOI :
10.1109/CLEOPR.1999.817975