Title :
Electron field emission from diamond-like carbon film under pulsed DC supply
Author :
Mao, D.S. ; Zhao, J. ; Li, W. ; Wang, X. ; Yu, Y.H. ; Liu, X.H. ; Zou, S.C. ; Zhu, Y.K. ; Li, Q. ; Xu, J.F.
Author_Institution :
Inst. of Metall., Acad. Sinica, Shanghai, China
Abstract :
In this paper, a hydrogen-free high sp3 content (>90%) diamond-like carbon (DLC) film was prepared by filtered arc deposition (FAD). Its electron field emission behavior and fluorescent displays are tested using a simple diode structure. Emission current is 5.4 μA at electric field as low as 5 V/μm, and emission current density of about 5 mA/cm2 can be obtained at electric fields as low as 20 V/μm. Field emission current is stable. A uniform fluorescence display of electron emission from the DLC film under an electric field of 12 V/μm was also obtained. It is thought that the fine electron emission property results from the smooth surface and high sp3 content of the DLC. A DLC column micro-emitter array was also fabricated by reactive-ion etching (RIE)
Keywords :
carbon; current density; electron field emission; field emission displays; 5.4 muA; C; column micro-emitter array; diamond-like carbon film; electron field emission; emission current density; filtered arc deposition; fluorescent displays; pulsed DC supply; reactive-ion etching; Atomic force microscopy; Diamond-like carbon; Diodes; Electron emission; Field emitter arrays; Flat panel displays; Fluorescence; Ion beams; Substrates; Testing;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1998.813814
