DocumentCode
3496606
Title
A Critical Study of the Soot Deposition Rate in ACVD Process
Author
Mishra, G.C. ; Pasare, Dattatray
Author_Institution
Sterlite Opt. Technol. Ltd., Maharashtra
fYear
2006
fDate
Oct. 2006
Firstpage
1
Lastpage
3
Abstract
Atmospheric Chemical Vapor Deposition (ACVD) process is widely used for silica soot deposition in the manufacture of optical fiber. In the present work a series of experiments were done on the ACVD lathe to study the deposition rate. Target core rod diameter, number of burners, distance between the burners and the distance between the target core rod and the burners were found the key parameters affecting the deposition rate. Average deposition rate of 30.2 gm/min with a material efficiency of 34% were achieved in three-burner experiment.
Keywords
chemical vapour deposition; optical fibre fabrication; silicon compounds; ACVD process; atmospheric chemical vapor deposition; core rod; material efficiency; optical fiber manufacturing; silica soot deposition; three-burner experiment; Fires; Fuels; Gases; Hydrogen; Optical fibers; Optical materials; Optical sensors; Preforms; Silicon compounds; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2006. AOE 2006. Asian
Conference_Location
Shanghai, China
Print_ISBN
978-0-9789217-0-5
Type
conf
DOI
10.1109/AOE.2006.307334
Filename
4100044
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