• DocumentCode
    3498523
  • Title

    Nonlinearity reduction in silicon resonators by doping and re-orientation

  • Author

    Shahmohammadi, M. ; Fatemi, H. ; Abdolvand, Reza

  • Author_Institution
    Oklahoma State Univ., Tulsa, OK, USA
  • fYear
    2013
  • fDate
    20-24 Jan. 2013
  • Firstpage
    793
  • Lastpage
    796
  • Abstract
    In this paper, it is shown for the first time that nonlinearity in n-type doped silicon micro-resonators can be reduced by modifying the doping concentration and the resonator alignment to a different crystalline orientation. Spring hardening, a trend opposite to the commonly-observed spring softening, is demonstrated in extensional resonators fabricated on a highly Phosphorus-doped (n~5×1019 cm-3) silicon substrate and oriented in the [100] direction. Therefore, it is hypothesized that for a specific level of doping concentration the nonlinear stiffness coefficients (k1 and k2) can be cancelled and the device will behave linearly for a large range of input power. It is observed that devices fabricated on an Arsenic-doped substrate with lower doping concentration (n~3×1019 cm-3) mechanically fail before they reach bifurcation, a preliminary proof for our hypothesis.
  • Keywords
    bifurcation; doping profiles; elastic constants; elemental semiconductors; microfabrication; micromechanical resonators; radiation hardening (electronics); silicon; softening; Si; Si:As; Si:P; [100] direction; arsenic-doped substrate; bifurcation; commonly-observed spring softening; crystalline orientation; doping concentration; extensional resonator fabrication; n-type doped microresonators; nonlinear stiffness coefficients; nonlinearity reduction; resonator alignment; spring hardening; Doping; Frequency response; Resonant frequency; Silicon; Softening; Springs; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
  • Conference_Location
    Taipei
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4673-5654-1
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2013.6474362
  • Filename
    6474362