DocumentCode
3499239
Title
A conductive channel size comparison of silicon dielectric and amorphous silicon antifuses
Author
Chen, Kueing-Long
Author_Institution
Texas Instrum. Inc., Dallas, TX, USA
fYear
1993
fDate
1993
Firstpage
165
Lastpage
167
Abstract
The physical size of an antifuse conductive channel is determined through the electrical characterization by using sidewall antifuse structures. The relationship of a programmed ´ON´ antifuse conductive channel size as a function of the programming current is established for both metal-metal amorphous silicon antifuses and poly-poly nitride/oxide antifuses. The result shows that the metal amorphous silicon antifuse requires at least 6 times higher programming current than the silicon dielectric antifuse to reach the same conductive channel size with 2000 AA diameter. The programming current ratio for these two types of antifuses increases with increasing antifuse conductive channel size.
Keywords
amorphous semiconductors; elemental semiconductors; integrated circuit technology; logic arrays; metallisation; silicon; Si-Si3N4-SiO2; amorphous elemental semiconductor; antifuse conductive channel; conductive channel size comparison; dielectric antifuse; field programmable gate array; poly-poly nitride/oxide antifuses; programming current; sidewall antifuse structures; Amorphous silicon; Conductivity measurement; Current measurement; Dielectrics; Electrical resistance measurement; Functional programming; Instruments; Kelvin; Layout; Logic arrays;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems, and Applications, 1993. Proceedings of Technical Papers. 1993 International Symposium on
Conference_Location
Taipei, Taiwan
ISSN
1524-766X
Print_ISBN
0-7803-0978-2
Type
conf
DOI
10.1109/VTSA.1993.263651
Filename
263651
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