• DocumentCode
    3499239
  • Title

    A conductive channel size comparison of silicon dielectric and amorphous silicon antifuses

  • Author

    Chen, Kueing-Long

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    1993
  • fDate
    1993
  • Firstpage
    165
  • Lastpage
    167
  • Abstract
    The physical size of an antifuse conductive channel is determined through the electrical characterization by using sidewall antifuse structures. The relationship of a programmed ´ON´ antifuse conductive channel size as a function of the programming current is established for both metal-metal amorphous silicon antifuses and poly-poly nitride/oxide antifuses. The result shows that the metal amorphous silicon antifuse requires at least 6 times higher programming current than the silicon dielectric antifuse to reach the same conductive channel size with 2000 AA diameter. The programming current ratio for these two types of antifuses increases with increasing antifuse conductive channel size.
  • Keywords
    amorphous semiconductors; elemental semiconductors; integrated circuit technology; logic arrays; metallisation; silicon; Si-Si3N4-SiO2; amorphous elemental semiconductor; antifuse conductive channel; conductive channel size comparison; dielectric antifuse; field programmable gate array; poly-poly nitride/oxide antifuses; programming current; sidewall antifuse structures; Amorphous silicon; Conductivity measurement; Current measurement; Dielectrics; Electrical resistance measurement; Functional programming; Instruments; Kelvin; Layout; Logic arrays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 1993. Proceedings of Technical Papers. 1993 International Symposium on
  • Conference_Location
    Taipei, Taiwan
  • ISSN
    1524-766X
  • Print_ISBN
    0-7803-0978-2
  • Type

    conf

  • DOI
    10.1109/VTSA.1993.263651
  • Filename
    263651