DocumentCode
3510331
Title
Comparison of volumetric registration algorithms for tensor-based morphometry
Author
Villalon, Julio ; Joshi, Anand A. ; Lepore, Natasha ; Brun, Caroline ; Toga, Arthur W. ; Thompson, Paul M.
Author_Institution
Sch. of Med., Lab. of Neuro Imaging, UCLA, Los Angeles, CA, USA
fYear
2011
fDate
March 30 2011-April 2 2011
Firstpage
1536
Lastpage
1541
Abstract
Nonlinear registration of brain MRI scans is often used to quantify morphological differences associated with disease or genetic factors. Recently, surface-guided fully 3D volumetric registrations have been developed that combine intensity-guided volume registrations with cortical surface constraints. In this paper, we compare one such algorithm to two popular high-dimensional volumetric registration methods: large-deformation viscous fluid registration, formulated in a Riemannian framework, and the diffeomorphic “Demons” algorithm. We performed an objective morphometric comparison, by using a large MRI dataset from 340 young adult twin subjects to examine 3D patterns of correlations in anatomical volumes. Surface-constrained volume registration gave greater effect sizes for detecting morphometric associations near the cortex, while the other two approaches gave greater effects sizes subcortically. These findings suggest novel ways to combine the advantages of multiple methods in the future.
Keywords
biomechanics; biomedical MRI; brain; data analysis; deformation; image registration; medical image processing; viscosity; 3D pattern analysis; MRI dataset; Riemannian framework; brain MRI scans; diffeomorphic Demons algorithm; large-deformation viscous fluid registration; surface-constrained volume registration; tensor-based morphometry; volumetric registration algorithms; Brain; Correlation; Fluids; Genetics; Surface morphology; Three dimensional displays; Volume measurement; Brain registration; genetics; morphometry; registration; twin studies;
fLanguage
English
Publisher
ieee
Conference_Titel
Biomedical Imaging: From Nano to Macro, 2011 IEEE International Symposium on
Conference_Location
Chicago, IL
ISSN
1945-7928
Print_ISBN
978-1-4244-4127-3
Electronic_ISBN
1945-7928
Type
conf
DOI
10.1109/ISBI.2011.5872694
Filename
5872694
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