Title :
Measurement of density and conductivity in DC plasma by RF probe in different conditions
Author :
Bahadori, F. ; Ghoranneviss, M. ; Mahmoudzadeh, M.
Author_Institution :
Plasma Phys. Res. Lab., Tehran, Iran
Abstract :
Summary form only given. As we know, the type of plasma is very important to sputtering process. Therefore, in this paper we used the radiofrequency probe to measuring the conductivity of DC plasma in different conditions of experimental, magnetic field and pressure and changes of gases. Then we obtained the optimum conditions for deposition of thin films.
Keywords :
density measurement; plasma density; plasma deposition; plasma probes; plasma transport processes; DC plasma; RF probe; conductivity measurement; density measurement; magnetic field; optimum conditions; radiofrequency probe; sputtering process; thin film deposition; Conductivity measurement; Density measurement; Gases; Magnetic field measurement; Plasma density; Plasma measurements; Pressure measurement; Probes; Radio frequency; Sputtering;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1340167
