DocumentCode :
3512019
Title :
Rad-Pro: effective software for modeling radiative properties in rapid thermal processing
Author :
Lee, B.J. ; Zhang, Z.M.
Author_Institution :
George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA
fYear :
2005
fDate :
4-7 Oct. 2005
Abstract :
To achieve accurate temperature measurements in rapid thermal processing (RTP), it is critical to determine the radiative properties of silicon wafers with thin-film coatings such as silicon dioxide, silicon nitride, and polysilicon. We have developed a reliable and easily accessible software tool, named Rad-Pro (for radiative properties) using Excel-VBA for prediction of the directional, spectral, and temperature dependence of the radiative properties for multilayer structures consisting of silicon including doping effects and related materials, such as silicon dioxide, silicon nitride, and polysilicon. Users can also input the optical constants of the materials. Rad-Pro also allows the selection of either coherent or incoherent calculation scheme, as well as the polarization states
Keywords :
elemental semiconductors; optical constants; rapid thermal processing; semiconductor doping; semiconductor thin films; silicon; silicon compounds; Excel-VBA; Si-SiN; Si-SiO2; doping effects; multilayer structures; optical constants; polarization states; polysilicon; radiative properties; rapid thermal processing; silicon dioxide; silicon nitride; silicon wafer; software tool; thin-film coating; Coatings; Materials reliability; Optical materials; Rapid thermal processing; Semiconductor device modeling; Semiconductor thin films; Silicon compounds; Software tools; Temperature dependence; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2005. RTP 2005. 13th IEEE International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-9223-X
Type :
conf
DOI :
10.1109/RTP.2005.1613719
Filename :
1613719
Link To Document :
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