Title :
Manufacturing lithography value/cost analysis
Author :
Bigelow, Mark G. ; Beek, P.T.
Author_Institution :
ASM-Lithography, Tempe, AZ, USA
Abstract :
A long-term value/cost of ownership model is presented which examines those parameters which most significantly differentiate lithography equipment and influence product innovation and productivity. These parameters are stepper throughput, overlay, yield, utilization, process automation, and a future technology path. Available market specifications for these stepper parameters are used in the model for comparison. It is concluded that flexible upgradeable high-throughput steppers operating simultaneously at full performance specification result in the lowest manufacturing cost per good die
Keywords :
economics; integrated circuit manufacture; lithography; flexible upgradeable high-throughput steppers; future technology path; lithography equipment; long-term value/cost of ownership model; manufacturing cost per good die; market specifications; overlay; process automation; product innovation; productivity; stepper throughput; value/cost analysis; yield; Cost function; Finance; Lithography; Load management; Manufacturing automation; Microelectronics; Productivity; Semiconductor device modeling; Technological innovation; Throughput;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
Conference_Location :
Burlingame, CA
Print_ISBN :
0-7803-0027-0
DOI :
10.1109/ISMSS.1991.146265