Title :
A new knowledge-based expert system for inspection of ULSI process flow
Author :
Fukuda, Etsuo ; Kimura, Minoru ; Miura, Kazuyuki ; Fuji, Hiromichi ; Tazawa, Masayoshi
Author_Institution :
Toshiba Corp., Kawasaki, Japan
Abstract :
A knowledge-based expert system for ULSI manufacturing has been developed in order to describe and inspect the process flow and generate data automatically for wafer control and other systems, maintaining data compatibility for ULSI fabrication. This system consists of four subsystems: a process flow generation system, a process flow inspection system, a data generation system, and a data translation system for controlling the process flow. All programs are run on a personal computer connected to a host computer in the manufacturing system. The knowledge-based expert system has proved to be a useful controlling method for semiconductor manufacturing. In particular, this system is very effective for ASIC (application specific integrated circuit) device manufacturing because of the large flexibility in the process flow description, the process flow inspection, automatic generation of wafer controlling data, and data standardization for other systems
Keywords :
VLSI; application specific integrated circuits; expert systems; inspection; integrated circuit manufacture; process computer control; ASIC device manufacturing; ULSI fabrication; ULSI manufacturing; automatic generation of wafer controlling data; data generation system; data standardization; data translation system; host computer; knowledge-based expert system; maintaining data compatibility; personal computer; process flow description; process flow generation system; process flow inspection; process flow inspection system; semiconductor manufacturing; subsystems; wafer control; Application specific integrated circuits; Automatic generation control; Control systems; Expert systems; Fabrication; Inspection; Manufacturing automation; Manufacturing processes; Semiconductor device manufacture; Ultra large scale integration;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
Conference_Location :
Burlingame, CA
Print_ISBN :
0-7803-0027-0
DOI :
10.1109/ISMSS.1991.146271